Precision plasma etching of Si, Ge, and Ge:P by insulating gas with added O2

Mar 31, 2014 · The impact of the O 2 content in SF 6 -O 2 gas mixtures on the etch rate and sidewall profile of silicon (Si), germanium (Ge), and phosphorous doped germanium (Ge:P) in reactive ion etching has been studied. The characteristics of etch rate and sidewall profile are greatly affected by the O 2 content. Below 50% of O 2 content, a large variation in Ge etch rates is found compared to that of Si, but for O 2 content above 50% the etch rates follow relatively the same trend.Get price

g3 - Sulfr hexafluoride Free Solutions

Alternative For High Voltage Applications. SF 6 sf 6 (or Sulphur Hexafluoride) had been the standard gas used inside high voltage electrical equipment as an insulating and arc-quenching medium. However, SF 6 Sulfr hexafluoride is also listed as an extremely potent greenhouse gas according to the Kyoto protocol, with 23,500 times the comparative Global Warming Potential of CO 2 and a lifetime of 3,200 years in the atmosphere.Get price

Surface Reactivity of Silicon and Germanium in CF4 -O2

After etching in CF 4 or SF 6 plasmas the Ge surface concentration of the SiGe alloy is increased relative to its bulk value and both fluorinated Si and Ge are observed by in situ x‐rayGet price

Precision plasma etching of Si, Ge, and Ge:P by Sulfr hexafluoride with

The impact of the O2 content in gaz sf6-O2 gas mixtures on the etch rate and sidewall profile of silicon (Si), germanium (Ge), and phosphorous doped germanium (Ge:P) in reactive ion etching has been studied. The characteristics of etch rate and sidewall profile are greatly affected by the O2 content. Below 50% of O2 content, a large variation in Ge etch rates is found compared to that of Si, but for O2 content above 50% the etch rates follow relatively the same trend.Get price

with an environmental impact GRID - GE Grid Solutions

6 concentration in the last 5 years +20 % GHGs infrared rays SF 6 SF 6 CO 2 CO 2 1 kg 23 500 kg CARS 16 Saving of running one year (10 000 km each) = OR Same technical performance safety with a drastically reduced impact of gas releases to atmosphere 1980 2016 1 to SF 6 for high voltage apparatus st EVER ALTERNATIVE g3 SF 6 OIL - AIR CAR 1Get price

Silicon Nanostructuring Using insulating gas/O2 Downstram Plasma Etching

The concentration curves, shown in Figure 2, exhibit a maximum for [F] at about 23% of O 2 in the discharge, and a monotonic increase of [O] with increasing of the oxygen percentage. Knizikevicius 16 performed a simulation of Si etching in SF 6 /O 2 plasma and found that at 27% O 2, the concentrationGet price

(PDF) Experimental investigation of SF 6 –O 2 plasma for

The distribution of electron energy and the concentrations of oxygen and fluorine exhibited similar patterns as functions of the oxygen concentration in the sf6 gas plasma in the two chambers, but theGet price

History of atmospheric SF from 1973 to 2008

Previous work has examined the concentration and growth of atmospheric sf6 gas during various intervals, using measure-ments made with different instruments. Maiss and Levin (1994) and Maiss et al. (1996) reported an increase in the global atmospheric burden throughout the 1980s and early 1990s using GC-ECD measurements of air samples taken atGet price

Decomposition of sf6 gas in an RF Plasma Environment

Sulfr hexafluoride was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygen to the reactor re-duced the electron density and, thus, reduced the dis-sociation of SF 6 and inhibited the production of free radicals. However, when the input power exceeded 40 W, η sf6 gas was not affected by the feed O 2 /SF 6Get price

Ge Concentration - an overview | ScienceDirect Topics

The saturated UV-induced index change increases approximately linearly with Ge concentration after exposure to UV radiation, from ~3 × 10 −5 (3 mol% GeO% 2) for standard fiber to ~2.5 × 10 −4 (~20 mol% GeO 2) concentration, using a CW laser source operating at 244 nm [92]. However, the picture is more complex than the observations basedGet price

Have you Heard of the Most Powerful Greenhouse Gas - Plan A

Meet Sulfr hexafluoride, CO2’s Larger CousinWhat Is This Crazy Gas Used for?Why Is sf6 gas Not Banned Yet?What’s The Effect on Humans?Are There Any Alternatives Out there?Among all the greenhouse gases that exist, CO2 gets the most attention. Today, we bring a different perspective. Think about everything that you know about CO2 and multiply it by roughly 24,000. This is how much a gas called Sulfr hexafluoride (sulphur hexafluoride) is stronger than CO2 in terms of global warming potential. You read right: sf 6 is the most potent greenhouse gas in existence with a global warming potential of 23,900 times the baseline of CO2. It means that one tonne of insulating gas in the atmosphere equals 23,900 tonnes of CO2. Even worse, gaz sf6 is synthetic and it does not have a natural sink or any effective disposal methods, thus, when emitted, simply accumulates in the atmosphere. A cherry on top is that its atmospheric lifetime can be up to 3,200 years years, which is well beyond CO2‘s 100-200- year lifetime. A gas 24k times more powerful than CO2 with a lifetime 16 times longer than CO2 is being released into our atmosphere, and very few people have the least idea.Get price

sf 6: The Truths and Myths of this Greenhouse Gas

Sulphur hexafluoride, commonly known as SF 6, has made a splash in the mainstream media of late. Several articles are pointing the finger at the growth in renewables—specifically wind turbines—as being responsible for the growth in SF 6 emissions, with some going as far as saying that the gas is the energy industry’s dirty little secret. In this spirit of transparency, we asked several experts from NTNU and SINTEF to separate the truths from the myths.Get price

sf 6 Gas Properties - sayedsaad.com

Oxygen + nitrogen (air) 0.03 % Water 15 ppm. C02 traces. HF 0.3 ppm. Sulfr hexafluoride is therefore 99.99 % pur. Chemical propertiesGet price

1,2 ID 2 ID - MDPI

fluorine on the polymer surface significantly decreased, whereas the oxygen concentration increased, leading to the formation of the hydrophilic surface. This effect, which was more pronounced for the sf 6 plasma, was explained by the electronegativity of both gases. Keywords: sulphur hexafluoride (Sulfr hexafluoride) plasma; tetrafluoromethane (CF4Get price

Flow Sensor - Draeger

Oxygen Sensor Capsule. An oxygen sensor performs the essential function of measuring the inspiratory O2 concentration in . Product Details. Get in touch with Dräger.Get price

Byproducts of Sulfur Hexafluoride (gaz sf6) Use in the Electric

Concentration (percent by volume)a HF Hydrogen fluoride 7664-39-3 1.0 SOF 2 (SF 4) b Thionyl sulfide (sulfur tetrafluoride) 7783-42-8 (7783-60-0) 0.5 SOF 4 Sulfur tetrafluoride oxide 13709-54-1 0.085 SiF 4 Silicon tetrafluoride 7783-61-1 0.085 S 2 F 10 (SF 5) c Disulfur decafluoride 5714-22-7 0.025 SO 2 F 2 Sulfuryl fluoride 2699-79-8 0.006 SOGet price

Precision plasma etching of Si, Ge, and Ge:P by Sulfr hexafluoride with added O2

Mar 31, 2014 · Sidewall angles range from a minimum of 80° to a maximum of 166°, with O 2 concentration of 20% yielding perfect anisotropic mesa etch. Also at this O 2 concentration, reasonable Si/Ge selectivity is possible. These observations indicate that by adjusting the O 2 concentration, precision plasma etching of Si, Ge, and Ge:P is possible.Get price

Myth About Sulfr hexafluoride Gas In Electrical Equipment

Apr 12, 2021 · Therefore, this limit does not mean that higher gaz sf6 concentrations pose any toxic hazard. According to Clause 7.1 of IEC 60480: “In principle, a mixture of 20% of oxygen and 80% sf6 gas can be inhaled without adverse effect. Concentrations above 20% would cause suffocation due to lack of oxygen.Get price

Relevance of Sulfr hexafluoride in Switchgear and its Contribution to

Since the 2010’s OEM’s like ABB, Eaton, General Electric, Schneider Electric and Siemens have made the shift towards promoting clean or green switchgear. Sulfr hexafluoride is used as an insulating medium in Switchgear and the sf6 gas free Switchgear, while having all the same advantages as sf6 gas based Switchgear, such as compactness, uses environmentally safeGet price

Precision plasma etching of Si, Ge, and Ge:P by insulating gas with added O2

Lightly doped Ge shows the highest etch rate at a O2 concentration up to 20%. Sidewall angles range from a minimum of 80° to a maximum of 166°, with O2 concentration of 20% yielding perfect anisotropic mesa etch. Also at this O2 concentration, reasonable Si/Ge selectivity is possible.Get price

Sulfur Hexafluoride insulating gas Safety Data Sheet SDS P4657

Formula : Sulfr hexafluoride 1.2. Relevant identified uses of the substance or mixture and uses advised against Use of the substance/mixture : Industrial use. Use as directed. 1.3. Details of the supplier of the safety data sheet Concorde Specialty Gases, Inc. 36 Eaton Rd. Eatontown, NJ 07712 USA T (732) 5449899- F (732) 5449894 www.concordegas.com 1.4.Get price

Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an Sulfr hexafluoride/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

Silicon DRIE vs. Germanium DRIE A Comparison in the

• Ge is more easily oxidized than silicon • Ge native oxide thickness is 4X that of silicon’s native oxide • Ge-O bond (3.66eV) is weaker than Si-O bond (4.82eV) • Ge affinity to oxygen is much greater than silicon’s affinity to oxygen • Ge affinity to oxygen is much greater than its affinity to fluorineGet price

Gas detection Respiratory protection equipment - GazDetect

We distribute a large range of calibration gas mixture cylinders in standard concentration as well as specific concentrations. Our calibration gas is ISO6142 certified, has an optimal shelf life, and is available in 34, 58, or 110 liters cylinders.Get price

Development Sf6 Alternative Gases in Switchgears - Switchgear

Nov 23, 2019 · Sf6 gas is widely used in electric power transmission and distribution systems, as for example in gas insulated switchgear (GIS), circuit breakers (CB) and load break switches. It combines unique electrical insulation and arc interruption capability. However, it is also a very strong greenhouse gas with a global warming potential (GWP) of about 23500 over …Get price

Applications | Nitrogen Systems Gas Solutions | GENERON

Effective oxygen exclusion requires purging of the original atmosphere by repeated pressurization with nitrogen, followed by venting until the oxygen concentration is less than 1%. For information on GENERON Products that are utilized for these applications, please click on the Product links below:Get price

Etch rates for micromachining processing-part II

ETCH RATES OF Si, Ge, SiGe, AND C (nm/min) sccm, , mtorr. The polygermanium deposition was preceded by the deposition of silicon seed layer approximately 6 nm thick using the recipe sccm,, mtorr. Germanium forms an oxide that is soluble in water. Thus, water with a high concentration of dissolved oxygen etches ger-manium.Get price

Chemistry Test 2 Flashcards | Quizlet

How many moles of oxygen are formed when 58.6 g of KNO3 decomposes according to the following reaction? The molar mass of KNO3 is 101.11 g/mol. 4 KNO3(s) → 2 K2O(s) + 2 N2(g) + 5 O2(g) A) 0.290 mol O2 B) 0.580 mol O2 C) 18.5 mol O2 D) 0.724 mol O2 E) 1.73 mol O2Get price

Sulfur hexafluoride - Wikipedia

Two major factors recommend its use: its concentration can be measured with satisfactory accuracy at very low concentrations, and the Earthatmosphere has a negligible concentration of SF 6 . Sulfur hexafluoride was used as a non-toxic test gas in an experiment at St. JohnWood tube station in London , United Kingdom on 25 March 2007. [26]Get price