Sulfr hexafluoride basic physical properties - AGC Chemicals

Density (gas) 6.04kg/m3 (25°C, 1atm) (liquid) 1,339kg/m3 (25°C) Vapor Pressure 1,264kPa (0°C) 2,109kPa (20°C) 3,327kPa (40°C) Surface Tension 8.02N/m (-20°C) Viscosity (gas) 1.5 x 10-5Pa・s (25°C, 1atm) (liquid) 27.7 x 10-5Pa・s (25°C) Refractive Index 1.000783 (0°C, 1atm) 0.408mL insulating gas/mL oil Solubility in Water 0.0063mL sf 6/mL water 0.01% 2.3-2.5 (N2=1)Get price

Decomposition of Sulfr hexafluoride in an RF Plasma Environment

sf 6 exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η sf6 gas was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygen to the reactor re-duced the electron density and, thus, reduced the dis-sociation of SF 6 and inhibited the production of free radicals.Get price

Low temperature etching of Si in high density plasma using sf6 gas/O2

Feb 01, 1995 · ELSEVIER Microelectronic Engineering 27 (1995) 453-456 MICROELECTRONIC ENGINEERING Low temperature etching of Si in high density plasma using sf6 gas/O2 Johann W. Barthaa, Johann Greschnera, M. Puechb and P. Maquinb aIBM German Manufacturing Technology Center, P.O. Box 266, D-71044 Sindelfingen, Germany bALCATEL CIT, 98, avenue de Brogny-BP, F-74009 Annecy, France Low temperature etching of SiGet price

insulating gas Gas Legislation | Sulfr hexafluoride Gas Analyser | sf 6 Rapidox

Information. Stricter legislation has seen changes to the requirements of the electrical power industry in relation to the handling of SF 6 gas. The Kyoto Protocol is an international agreement between nations that came into force in 2005.Get price

Si/SiO2 etching in high density sf 6/CHF3/O2 plasma

The results provided the insight of the Si and SiO 2 etching characteristics in the RFI-type high density plasma etcher. Based on the study of Si and SiO 2 etch rates, the Si/SiO 2 etch rate ratio was mapped out.Get price

(PDF) Cryogenic Etching of Silicon with sf6 gas/O2/SiF4 plasmas

The kinetics of high aspect ratio, anisotropic silicon etching in a sf 6–O2 plasma is investigated with a combination of Monte Carlo simulations and inductively coupled plasma etching experiments.Get price

Plasma etching of Si and SiO2 in sf 6–O2 mixtures: Journal of

Jun 04, 1998 · The products of reaction and etch rates of Si and SiO2 in Sulfr hexafluoride‐O2 plasmas have been studied as a function of feed composition in an alumina tube reactor at 27 mHz, 45 W, and 1 Torr. There is a broad...Get price

Mechanism of Formation of SF Decomposition Gas Products and

The gaz sf6 reactor tank (A), closed (B) and opened pole tank (C) with molecular sieves and lit of the pole tank (D). The optical image of insulator surface containg molecular sieves after the operating the pole tank is shown in Fig. 1. The insulating gas reaction tank, the closed reaction pole tank with molecular sieves, theGet price

(PDF) Oxidation threshold in silicon etching at cryogenic

In silicon etching in sf 6/O2 plasmas, an oxidation threshold appears when the oxygen content is large enough. A SiOxFy passivation layer is formed under such conditions.Get price

Oem Voc Solution For Sale

gaz sf6Relations (Henan) Co., Ltd. is a professional company focusing on research, production and sales of Sulfr hexafluoride Tools, includ insulating gas Monitoring Analysis equipment.gaz sf6 Recyling Handling Equipment.insulating gas On-site service and training.There is a place where you’ll get the Perfect sf6 gas solution for all your needs. We have 421 employees , factory covering as large as 4000 Sq. meters, and sales office in Henan Zhengzhou.Get price

High-aspect-ratio deep Si etching in gaz sf6/O2 plasma. II

Jul 28, 2010 · In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with Sulfr hexafluoride/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral...Get price

Sulfur hexafluoride | F6S - PubChem

Sulfur hexafluoride is a sulfur coordination entity consisting of six fluorine atoms attached to a central sulfur atom. It is the most potent greenhouse gas currently known, with a global warming potential of 23,900 times that of CO2 over a 100 year period (Sulfr hexafluoride has an estimated lifetime in the atmosphere of between 800 and 3,000 years).Get price

Investigation of inductively coupled Sulfr hexafluoride plasma etching of Si

Investigation of inductively coupled sf6 gas plasma etching of Si and SiO2 throught a global model coupled with langmuir adsorption kinetics Abstract: Summary form only given. Sulfur hexafluoride (SF 6 ) plasmas are commonly used in the deep etching of silicon (Si), silicon oxide (SiO 2 ) and more recently silica glass [1].Get price

Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an Sulfr hexafluoride/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

Excitation of Ar, O2, and sf 6/O2 plasma discharges using

Jul 13, 2018 · Jansen H, de Boer M, Wensink H, Kloeck B and Elwenspoek M 2001 The black silicon method. VIII. A study of the performance of etching silicon using gaz sf6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source Microelectron. J. 32 769–77. Crossref Google ScholarGet price

Hydrogen vehicle - Wikipedia

Hydrogen has a very low volumetric energy density at ambient conditions, compared with gasoline and other vehicle fuels. It must be stored in a vehicle either as a super-cooled liquid or as highly compressed gas, which require additional energy to accomplish. [111]Get price

Processing of inertial sensors using sf 6-O2 Cryogenic plasma

/ Processing of inertial sensors using Sulfr hexafluoride-O2 Cryogenic plasma process. SAFE 2003 Semiconductor advances for future electronics. editor / s.n. Utrecht : Stichting voor de Technische Wetenschappen, 2003. pp. 683-686Get price

Solvay Special Chemicals

function of temperature and density 26 Curves of pressure/temperature 27 and viscosity Curves of thermo conductivity 28 and heat transfer Optical properties 29 Chemical behaviour Behaviour at elevated temperatures 30 Behaviour under the influence of electrical discharges 30 Corrosion characteristics of insulating gas and its decomposition products 30Get price

sf6-gas-servicing-equipment-information – ENERVAC

Fast insulating gas Gas Recovery. Easy dual valve operation. 180 lb. (82 kg.) available on-board storage capacity. Cambridge, Ontario N3C 1Z4 Canada +1 519-651-1034Get price

sf6 density monitor, sf6 density monitor Suppliers and

Description: Sf6 density pressure switch is an economical and reliable way to monitor sf6 gas gas density and leakage over a wide temperature range. These instruments are used to monitor gaz sf6 gas density in sealed tanks. They are applied to indicate gas density and to provide a signal outputs when the density reaches preset threshold values.Get price

SimulationsofSiandSiO EtchinginSF +O Plasma

SimulationsofSiandSiO2 EtchinginSulfr hexafluoride+O2 Plasma 481 with SF5 radicals (Eq. (1.3)). At 27% O2, the concen- tration of F atoms approaches the maximum value. At this point, almost all SF5 radicals in Sulfr hexafluoride + O2 plasmaGet price

US5182234A - Profile tailored trench etch using a sf 6 -O2

US5182234A - Profile tailored trench etch using a Sulfr hexafluoride -O2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen - Google PatentsGet price

The Impact of Carrier Gas Selection on SO2 and sf 6 Melt

FOXCONN TECHNOLOGY GROUPFOXCONN TECHNOLOGY GROUPFOXCONN TECHNOLOGY GROUP 4th Intl Conference on gaz sf6 and the Environment In 100% N2 + Sulfr hexafluoride/SO2 In 100% N2 + sf6 gas/SO2 Mg vapor + O2 = Smoke Mg vapor + O2 = Smoke Oxide -- O2 Mg metal --O2 MgO smoke MgO and fire!! MgF2/MgS--With mechanical agitation • The film is torn and brokenGet price

sf6 gas monitor, sf6 gas monitor Suppliers and Manufacturers

You can also choose from oem sf6 gas monitor There are 739 suppliers who sells sf6 gas monitor on Alibaba.com, mainly located in Asia. The top countries of suppliers are China, Taiwan, China, from which the percentage of sf6 gas monitor supply is 96%, 3% respectively.Get price

Study of SiO2 Etching Processing with CH4/Sulfr hexafluoride Plasmas - Man

May 17, 2020 · The etching mechanism of SiO2 which is etched by inductively coupled plasma in CH4/sf6 gas is made up of four phenomena: ionization, deposition, sputtering, and etching. These phenomena are at work at th...Get price

Coumarin | C9H6O2 - PubChem

Coumarin is a chromenone having the keto group located at the 2-position. It has a role as a fluorescent dye, a plant metabolite and a human metabolite.Get price

Transmitter for gas density, temperature, pressure and

Transmitter for gas density, temperature, pressure and humidity of insulating gas gas The model GDHT-20 transmitter is a multi-sensor system with digital output for the measurement parameters of pressure, temperature and humidity.Get price

Process Gas Chromatographs | Yokogawa America

The GC8000 is a process analyzer that uses gas chromatography to measure the composition of multiple components in a stream. Engineered with reliable electronics and intelligently designed columns and valves, the GC8000 improves ease of maintenance while reducing operating costs.Get price

Siemens insulating gas Gas Density Monitoring | Fluorinated Gas

Siemens Sulfr hexafluoride Gas Density Monitoring The document below was a presentation conducted at the 2014 Workshop for Sulfr hexafluoride Emission Reduction Strategies. You may need a PDF reader to view some of the files on this page.Get price

Black Silicon SERS Substrate: Effect of Surface Morphology on

By adjusting the O2 and Sulfr hexafluoride flow rates in the cryogenic plasma etching process, different surface morphologies of the black silicon substrate was produced without performing the lithographic process. It was found the Raman signals were better enhanced as the tip density of the black silicon substrate increased.Get price