ດາວໂຫຼດແບບຟອມຕ່າງໆ

National Social Security Fund, The Social Security Organization (SSO) of Lao PDR is a juridical entity guided by the Minister of Labor Social Welfare. SSO provides social security rights to enterprises workers in Lao PDR.Get price

High-aspect-ratio deep Si etching in sf 6/O2 plasma. II

Jul 28, 2010 · In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with insulating gas/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral...Get price

A Kinetic Model for Plasma Etching Silicon in a gaz sf6/O2 RF

IEEE Xplore, delivering full text access to the worldhighest quality technical literature in engineering and technology. | IEEE XploreGet price

(PDF) Oxidation threshold in silicon etching at cryogenic

In silicon etching in insulating gas/O2 plasmas, an oxidation threshold appears when the oxygen content is large enough. A SiOxFy passivation layer is formed under such conditions.Get price

Decomposition of gaz sf6 in an RF Plasma Environment

sf6 gas clearly increased from 37.79 to 95.68% because of an increase in power from 5 to 20 W. When the power exceeded 40 W, η insulating gas exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η Sulfr hexafluoride was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygen to the reactor re-Get price

Oxidation of sulfur hexafluoride - ScienceDirect

Although SF 6 is extraordinarily inert toward oxygen, reaction can be initiated by the electrical explosion of extremely small masses of platinum into SF 6 O 2 mixtures. It is shown that chemically trivial amounts of exploding metal can be effective initiators of the SF 6 oxidation. Under our experimental conditions the major reaction forms SOF 4.Get price

Plasma etching of Si and SiO2 in sf6 gas–O2 mixtures: Journal of

Jun 04, 1998 · With an SF 6 ‐O 2 mixture in the absence of silicon, the final reaction products are F 2, SOF 4, and SO 2 F 2. The product distribution was unaffected by small SiO 2 substrates. When Si is etched, SiF 4 is the only stable silicon‐containing etch product and SOF 2 is formed in oxygen‐poor mixtures. Rapid etch rates (≳10 4 Å/min for Si) can be obtained with a high selectivity in favor of silicon (Si:SiO 2 ≳40:1); thus SF 6 ‐O 2 mixtures may represent an attractive alternative toGet price

Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an sf 6/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

SimulationsofSiandSiO EtchinginSF +O Plasma

SimulationsofSiandSiO2 EtchinginSulfr hexafluoride+O2 Plasma 481 with SF5 radicals (Eq. (1.3)). At 27% O2, the concen- tration of F atoms approaches the maximum value. At this point, almost all SF5 radicals in sf 6 + O2 plasmaGet price

insulating gas Molecular Geometry, Lewis Structure, Shape, and Polarity

Sulfr hexafluoride Molecular Geometryinsulating gas PropertiesLewis Structure of sf6 gasIs sf6 gas Polar Or non-polar?Sulfur hexafluoride has a central sulfur atom around which one can see 12 electrons or 6 electron pairs. Thus, the Sulfr hexafluorideelectron geometry is considered to be octahedral. All the F-S-F bonds are 90 degrees, and it has no lone pairs.Get price

gaz sf6 Gas Decomposed! Best handling practices APC

Billy J Lao General Manager DILO Direct, Odessa FL / Casa Grande AZ . Sulfr hexafluoride Gas Decomposed! Best handling practices APC Neil Hutchins Senior Engineer Southern Company Services Substation Maintenance Support Support to Alabama Power Company www.dilo.com ‐ www.dilodirect.comGet price

Byproducts of Sulfur Hexafluoride (gaz sf6) Use in the Electric

Byproducts of Sulfur Hexafluoride (SF 6) Use in the Electric Power Industry Prepared for U.S. Environmental Protection Agency Office of Air and RadiationGet price

Selective SiO2/Al2O3 Etching in CF4 and Sulfr hexafluoride High-Density

Selective SiO2/Al2O3 Etching in CF4 and sf6 gas High-Density Plasma Hsiao, R. / Miller, D. / Santini, H. / Robertson, N. / Electrochemical Society | 1996 print versionGet price

PAPER OPEN ACCESS Anisotropic plasma etching of Silicon in

Content from this work may be used under the terms of the CreativeCommonsAttribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.Get price

Did anyone have experience in etching SiO2 with gaz sf6 in ICP

The gasese we have are: sf6 gas(0-100sccm), O2(0-20sccm), Ar(0-5sccm), and C4F8. my sample is 3um SiO2 deposited on the surface of Si wafer. The recipe I designed for 3um SiO2 etching is:Get price

Alternatives for Sulfr hexafluoride | 2020 | Siemens Energy Global

Alternatives for insulating gas urgently sought In most of the worldsubstations sulfur hexafluoride (SF 6 ) is the insulating gas of choice. Still, due its potential climate impact, industry is looking for environmentally friendly solutions – and they have options.Get price

Energy industry free from insulating gas: latest market developments

Apr 11, 2019 · The European Commission urges for Sulfr hexafluoride alternatives . In 2014, the European Commission reinforced a 2006 F-Gas regulation No. 517/2014 with the aim of reducing the EU’s F-gas emissions by two-thirds from 2014 levels by 2030. Within the EU, sf6 gas was banned for most of its applications, except for its use in the energy industry – its main consumer.Get price

sf6 gas Gas or Sulfur Hexafluoride Gas Properties | Electrical4U

History of Sulfr hexafluorideChemical Properties of Sulfr hexafluoride GasElectrical Properties of Sulfr hexafluoride Gasinsulating gas or sulfur hexafluoride gas molecules are combined by one sulfur and six fluorine atoms. This gas was first realized in the year 1900 in the laboratories of the Faculte de Pharmacie de, in Paris. In the year of 1937, General Electrical Company first realized that Sulfr hexafluoride gas could be used as gaseous insulating material. After the Second World War, i.e. in the middle of 20th century, the popularity of using sulfur hexafluoride gas as an insulating material in electrical system was rising very r...Get price

Onsite Oxygen Generator Manufacturers - PSA, Membrane | GENERON

GENERON has over 50 years of experience in the design and manufacturing of Oxygen Generating Systems. Our systems are designed to produce Oxygen on demand. With over 2000 Oxygen and Nitrogen Generators supplied worldwide we have the experience to meet our customers exact requirements.Get price

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Googlefree service instantly translates words, phrases, and web pages between English and over 100 other languages.Get price

Outlook – free personal email and calendar from Microsoft

Expand your Outlook. We've developed a suite of premium Outlook features for people with advanced email and calendar needs. A Microsoft 365 subscription offers an ad-free interface, custom domains, enhanced security options, the full desktop version of Office, and 1 TB of cloud storage.Get price

Authority decision on SHE Transmission Sulfr hexafluoride Exceptional Event

If a leak of insulating gas occurs on a companynetwork due to an event that it feels was beyond its reasonable control then the company may make a case to the Authority to designate it an Exceptional Event and for all or some of the quantity of Sulfr hexafluoride leaked during the event to be excluded when we calculate the companyrevenue reward or penalty.Get price

Myth About Sulfr hexafluoride Gas In Electrical Equipment

Apr 12, 2021 · This is just the UK, sf6 gas stays in the atmosphere for a minimum 1000 years where as CO2 100 years. Sulfr hexafluoride is on the increase the US expect a 6.2% increase over the next 6 years. sf 6 might not damage the Ozone but it will accelerate Global Warming given the fact that it stays in the atmosphere longer can cause more damage over a longer period of time.Get price

Sulfr hexafluoride Gas Properties - sayedsaad.com

Sulfr hexafluoride Gas Properties. Introduction. gaz sf6 is a combination of sulfur and fluorine its first synthesis was realized in 1900 by French researchers of the Pharmaceutical Faculty of Paris. It was used for the first time as insulating material, In the United States about 1935. In 1953, the Americans discovered its properties for extinguishing theGet price

The sf6 gas-ReUse-Process A contribution on the sustainability of SF

the used Sulfr hexafluoride is regenerated into new virgin gas. gaz sf6 which has been regenerated by Solvay fulfills even a higher specification than that required by IEC 60376, as illustrated in Table 1. In order to be able to transform the used SF. 6 . gas back into new virgin SF. 6 . the used gas must fulfill the so-called SF. 6 – ReUse – Specification inGet price

Sulfur hexafluoride - Wikipedia

Sulfur hexafluoride (SF 6) or sulphur hexafluoride (British spelling), is an extremely potent and persistent greenhouse gas that is primarily utilized as an electrical insulator and arc suppressant.Get price

Sulfr hexafluoride Recovery Machine - sf6 gas Gas Handling | YUNENG

*The machine size, the weight will change slightly due to different configurations. Advantages of Sulfr hexafluoride Gas Recovery Machine. sf 6 is commonly used in power applications and is used worldwide in high-voltage circuit breakers, metal-enclosed switch cabinets, linear accelerators, high-voltage transformers, capacitors, and gas-insulated circuits.Get price

Chemistry studies of sf 6/CF4, insulating gas/O2 and CF4/O2 gas phase

In this work, mass spectrometry and optical emission spectroscopy techniques were used to monitor the molecular and atomic neutral species during SF 6 /CF 4, SF 6 /O 2 and CF 4 /O 2 plasmas generated in a radio-frequency Hollow Cathode Reactive Ion Etching (HCRIE) reactor keeping constant the following operational conditions: total gas flow rate, gas pressure, and discharge power.Get price

Sulfr hexafluoride | NASA Airborne Science Program

PANTHER uses Electron Capture Detection and Gas Chromatography (ECD-GC) and Mass Selective Detection and Gas Chromatography (MSD-GC) to measure numerous trace gases, including Methyl halides, HCFCs, PAN, N20, sf6 gas, CFC-12, CFC-11, Halon-1211, methyl chloroform, carbon tetrachloride.Get price